After more than a decade of research and development, Tokyo Electron Miyagi Ltd. has introduced an innovative semiconductor etching method that achieves etch rates up to five times faster than ...

Engineers in the CNST NanoFab have developed a new plasma etching technique for silicon which improves the etch rate, the mask selectivity, and the sidewall profile by optimizing the addition of argon ...

There are five important characteristics to consider in selecting any dry etch process. These are rate, feature profiles, compositional selectivity, damage and uniformity across the wafer. In general, ...

Physicist Igor Kaganovich at the Department of Energy's (DOE) Princeton Plasma Physics Laboratory (PPPL) and collaborators have uncovered some of the physics that make possible the etching of silicon ...

What Is Etching In Semiconductor Manufacturing? In semiconductor manufacturing, etching is a crucial process that sculpts the intricate circuits on a silicon wafer. It works by selectively removing ...

For maximum resolution in a scanning tunneling microscope (STM), an extremely sharp metallic tip is required, which serves as the point through which the STM “scans” a sample. A blunt tip reduces STM ...

One of the major steps in the chemical processing of subtractive printed boards is etching, or removal of copper, to achieve the desired circuit patterns. Etching is also used for surface preparation ...

A team of physicists has uncovered some of the physics that make possible the etching of silicon computer chips, which power cell phones, computers, and a huge range of electronic devices. Physicist ...